Verified: 10 months ago
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The FLUX.1 [dev] Model is licensed by Black Forest Labs. Inc. under the FLUX.1 [dev] Non-Commercial License. Copyright Black Forest Labs. Inc.
IN NO EVENT SHALL BLACK FOREST LABS, INC. BE LIABLE FOR ANY CLAIM, DAMAGES OR OTHER LIABILITY, WHETHER IN AN ACTION OF CONTRACT, TORT OR OTHERWISE, ARISING FROM, OUT OF OR IN CONNECTION WITH USE OF THIS MODEL.
[V2.0 Update ]
🇺🇸 English
This workflow uses the ImageCompositeMasked node instead of a Stitch node, ensuring that only the inpainted area is affected while the rest of the image remains untouched. The structure has been simplified for ease of use.
The Save Image node at the bottom right produces the final result.
🇰🇷 한국어
이 워크플로우는 Stitch 노드 대신 ImageCompositeMasked 노드를 활용하여,
인페인트 영역만 수정되고 나머지 부분에는 영향이 가지 않도록 구성했습니다.
또한 사용이 간편하도록 간소화하였습니다.
우측 하단의 Save Image 노드가 최종 결과물을 출력합니다.
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